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acetone for 30 min using sonication and were used to produce epoxy-graphene composite coatings as described in section 4.2.1. 4.1.4. CVD graphene Graphene produced by CVD technique was used in this project to evaluate its potential as a Raman based wide-area strain sensor. CVD graphene was prepared in- house (Figure 4.6) and kindly supplied by Dr. Amada Lewis (School of Materials, University of Manchester). Figure 4.6: Photograph of the reactor used to produce the CVD graphene. The CVD graphene used in this project was grown by hot wall CVD process.336 The copper foils (Alfa Aesar product #13382) were cut into 1 × 1 cm squares and loaded into 1” fused silica furnace tube. The pressure in the tube was lowered by a rotary vane pump (Edwards RV12) in combination with a turbo pump (Leyboid Oerlikon Turbovac 50). Hydrogen was introduced in the furnace tube at 10 sccm for 30 min to displace any air in the tube. Then the hydrogen flow was reduced to 1 sccm to achieve a pressure value of 5 × 10-3 mbar. Once the desired pressure was achieved, the temperature was increased to 1040 oC at a heating rate of 40 oC/min and the hydrogen flow was continued for 30 min to anneal the copper foil. The precursor methane was introduced at the rate of 2 sccm and the pressure maintained was about 0.01 mbar. After 30 min, the methane flow was terminated and the furnace was allowed to cool down in the room temperature. This process resulted in the formation of graphene on either side of the Cu foil, which was then carefully removed from the furnace tube. Chapter 4 – Methods 111PDF Image | PRODUCTION AND APPLICATIONS OF GRAPHENE AND ITS COMPOSITES
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