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Raju et al.280 (Chapter 7) MC SLG CVD SLG CVD SLG ~ - 53 (s) ~ - 30 (s) - 36 2D = 2.7 from ref.256 PMMA/4 point 0.3 bending 3 PET/Stretch 633 Uni (T) Li et al.281 514 Uni (T) CVD SLG - 12.8 2D = 3.55 0.4 from ref.256 PET-PMMA/4 point bending Xu et al.282 633 Uni (T) Metzger et al.283 633 Bi (C) MC SLG 77±7 203 ± 20 2DE = 3.8, - 0.066 GE = 2.4 ±0.006 SiO2/Shallow depression Tsoukleri et al.269 514 Uni (C) MC SLG 25.8 (b) - 0.9 (b) 59.1 (s) - 1.2 (s) PMMA/Cantilever beam bending Frank et al.270 Uni (C) MC SLG 22.3 to 5.5 to 33.1 10.1 - 0.7 PMMA/Cantilever beam bending 785 Abbreviations (where applicable) related to Table 3-1: MC – Micromechanically Cleaved, CVD – Chemical Vapour Deposition, SLG – Single Layer Graphene, TLG – Tri Layer Graphene Uni – Uniaxial strain, Bi – Biaxial strain, (T) – Tension, (C) – Compression (b) – Bare graphene on substrate without any top coat, (s) – Graphene sandwiched between substrate and a top coat (polymer) Superscripts: E – Experimentally calculated, T – Theoretical calculation 83PDF Image | PRODUCTION AND APPLICATIONS OF GRAPHENE AND ITS COMPOSITES
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