PDF Publication Title:
Text from PDF Page: 001
(12)UnitedStatesPatent Bhanapetal. (54) VAPORPHASETREATMENTOF DELECTRICMATERALS (75)Inventors:AnilS.Bhanap,Milpitas,CA(US); RobertR.Roth,Sunnyvale,CA(US); 5,915,175A 6/19Wise. .438,238 KikueS.Burnham,SanRamon,CA (US);BrianJ.Daniels,LaHonda,CA (US);DenisH.Endisch,Cupertino,CA (US);IlanGolecki,Parsippany,NJ(US) (73) Assignee: HoneywellInternational,Inc., Morristown,NJ(US) - (*) Notice: Subjecttoanydisclaimer,thetermofthis patentisextendedoradjustedunder35 U.S.C.154(b)by187days. (21) Appl.No.:11/086,010 DE 6,037.275A 3,2000 W W- uetal. . .438/780 6,042,94.A 3/20 Yangetal..430,296 6,090,724.A 7/20Sheltonetal. 6,177,143B1 1/2001Treadwelletal..427,515 6,208,014 B1 3/2001 Wu etal. .257,629 (Continued) FOREIGN PATENT DOCUMENTS 1013O824 10,2002 (Continued) OTHER PUBLICATIONS 1-1. (22) Filed: Mar.22,2005 Prior Publication Data S.V. Nita, etal., "Surface Modified Spin-On Xerogel Films as InterlayerDielectrics',1999AmericanVacuumSociety,p.205 212. (Continued) PrimaryExaminer—AlexanderGGhyka (74)Atorney,Agent,orFirm—RichardS.Roberts;Roberts & Roberts,L.L.P. (57) ABSTRACT Theinventionconcernsamethodforapplyingasurfacemodi ficationagentcompositionfororganosilicateglasdielectric films.Moreparticularly,theinventionpertainstoamethod fortreatingasilicateororganosilicatedielectricfilmona substrate,whichfilmeithercomprisessilanolmoietiesorhas hadatleastsomepreviouslypresentcarboncontainingmoi etiesremovedtherefrom.Thetreatmentaddscarboncontain ingmoietiestothefilmand/orsealssurfaceporesofthefilm, whenthefilmisporous. (65) (51) (52) (58) (56) US2006/0216952A1 Sep.28,2006 Int.Cl. HOIL 2/3 (2006.01) U.S.Cl..438/787;438/781;438/790: 438/4;257/E21.243 FieldofClasificationSearch.438/787, 438/790,781,4 Seeaplicationfileforcompletesearchhistory. ReferencesCited U.S.PATENTDOCUMENTS 4,567,221 A 4,624,739 A 4,654,269 A 5,079,300 A 5,271,777 A 1/1986 Maruyamaetal..542/436 11/1986 Nixonetal. .438/723 3/1987 Lehrer.428,428 1/1992 Dubrowetal..525,106 12/1993 Duffy.148,537 36Claims,3DrawingSheets -Catalyst Temp. controlled reservoir Tempcontrolled reaction chamber WacLur -Showerhead Wafer (heatedwithlamps) SystemConfigurationC USOO7678712B2 (10)PatentNo.: US 7,678,712B2 (45)DateofPatent: Mar.16,2010 5,429,730A 5,479,727A 5,576,247 A 7,1995Nakamuraetal..204,192.34 1/1996 Fineetal..34,516 11/1996 Yanoetal.. .438,760 St.A 1E.Singssal..53.i. -W S C al. ....... ---PDF Image | VAPOR PHASE TREATMENT OF DELECTRIC MATERALS
PDF Search Title:
VAPOR PHASE TREATMENT OF DELECTRIC MATERALSOriginal File Name Searched:
US7678712.pdfDIY PDF Search: Google It | Yahoo | Bing
Sulfur Deposition on Carbon Nanofibers using Supercritical CO2 Sulfur Deposition on Carbon Nanofibers using Supercritical CO2. Gamma sulfur also known as mother of pearl sulfur and nacreous sulfur... More Info
CO2 Organic Rankine Cycle Experimenter Platform The supercritical CO2 phase change system is both a heat pump and organic rankine cycle which can be used for those purposes and as a supercritical extractor for advanced subcritical and supercritical extraction technology. Uses include producing nanoparticles, precious metal CO2 extraction, lithium battery recycling, and other applications... More Info
| CONTACT TEL: 608-238-6001 Email: greg@infinityturbine.com | RSS | AMP |