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ensure the complete removal of etchant leaving behind PMMA/graphene floating in the DI water in a beaker. Meanwhile SU-8 (300 nm) photoresist was spin coated on the PMMA beam (5 mm) and baked in an oven at 70 oC for 10 min. This beam was then used to pick the PMMA/graphene. The sample was rested for 5 min before baking it in oven at 70 oC for 10 min for drying. Dr Recep Zan from School of Materials, University of Manchester did the transfer of CVD graphene on PMMA beams. 4.3. CHARACTERISATION 4.3.1. Optical microscopy Optical microscopy (Olympus BH-2 microscope) was used to identify the number of layers, position of MC graphene and the quality of CVD graphene coatings on the composite samples. Either 50 × or 100 × objective lens was used to obtain the images. The optical microscopes on the Reinshaw Raman spectrometers were also used to obtain images. 4.3.2. Scanning electron microscope Philips XL 30 Field Emission Scanning Electron Microscope operated at 5-10 kV accelerating voltage was used to study the morphology of the graphene. The samples were mounted on aluminium SEM stubs (Agar Scientific AGG301) using adhesive carbon tape (Agar Scientific AGG3939), followed by sputter coating the non-conductive samples with gold. A line of silver paint was applied over the edge of the sample and the carbon tape for efficient discharging of electrons generated by the beam. Secondary electron mode was used to image all the samples except the CVD coatings, where back scattered electron mode was used to image the grain boundaries in the CVD graphene.340 SEM samples were prepared from graphene dispersions by drop casting ~50 μl of dispersion on a SiO2/Si wafer. The samples were dried at 80 oC in vacuum overnight to remove any solvents. Chapter 4 – Methods 118PDF Image | PRODUCTION AND APPLICATIONS OF GRAPHENE AND ITS COMPOSITES
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